陈金平，男，2000年7月毕业于山东大学化学学院，获理学学士学位；2000年9月—2005年7月就读于中国科学院理化技术研究所，获理学博士学位，毕业后留所工作，任助理研究员；2007年4—2009年3月，受日本学术振兴会(JSPS)的资助，在日本京都大学大须贺(Atsuhiro Osuka)实验室从事博士后研究工作，2009年4月回国，现任中国科学院理化技术研究所研究员，博士生导师。入选2009年度北京市科技新星（B类），首届中国科学院青年创新促进会会员（2011年），优秀会员（2015年），理化所优秀员工（2021年）。主要从事高档光刻胶的研发与产业化工作，主持或参与02重大专项、国家自然科学基金重大/面上项目、中科院科技专项等项目，在J. Am. Chem. Soc.、ACS Appl. Mater. Interfaces、 J. Mater. Chem. C 等学术刊物上发表学术论文100余篇，申请光刻胶发明专利54项（授权23项）。
新型超高分辨光刻胶材料体系、光刻机理和工艺研究；
特种光刻胶材料体系的开发与应用研究；
有机功能化合物合成及光物理性质研究。
作为项目（子课题）负责人先后承担（参与）国家科技重大专项（02专项）、财政部重大科研装备研制项目、中科院先导项目、自然基金重大项目（课题）等。
1. Rongrong Peng, Peng Lian, Jinping Chen*, Tianjun Yu, Yi Zeng, Shuangqing Wang, Xudong Guo, Rui Hu, Jun Zhao, Yanqing Wu,Guoqiang Yang* and Yi Li*, ‘Lithographic performances of aryl sulfonate ester modified polystyrene as nonchemically amplified resists’ Ind. Chem. Mater., 2025, 3, DOI: 10.1039/d5im00046g
2. Rongrong Peng, Jinping Chen*, Tianjun Yu, Yi Zeng, Shuangqing Wang, Xudong Guo, Rui Hu, Peng Tian, Michaela Vockenhuber, Dimitrios Kazazis, Jun Zhao, Yanqing Wu, Yasin Ekinci,* Guoqiang Yang*, Yi Li*, ‘Nonchemically-amplified molecular resists based on calixarene derivatives enabling 14 nm half-pitch nanolithography’ Chin. J. Chem. 2025, 43(13), 1513-1522 (Front Cover).
3. Zhuoran Liu, Jinping Chen*, Tianjun Yu, Yi Zeng, Xudong Guo, Shuangqing Wang, Rui Hu, Michaela Vockenhuber, Peng Tian, Dimitrios Kazazis, Yasin Ekinci,* Guoqiang Yang*, Yi Li*, ‘Performance Optimization of Sulfonium-Functionalized Molecular Resists for EUV and Electron Beam Lithography’ ACS Appl. Electron Mater., 2025, 7 (6), 2640-2649.
4. Xiaodong Yuan, Jinping Chen*, Tianjun Yu, Yi Zeng, Xudong Guo, Shuangqing Wang, Rui Hu, Peng Tian, Michaela Vockenhuber, Dimitrios Kazazis, Yasin Ekinci,* Jun Zhao, Yanqing Wu, Guoqiang Yang*, Yi Li*, ‘Nonchemically Amplified Molecular Resist based on Multi-sulfonium Modified Triptycene for Electron beam and Extreme Ultraviolet Lithography’ J. Micro/Nanopattern. Mater. Metrol. 2024, 23(3), 034601.
5. Huiwen An, Jinping Chen*, Yi Zeng, Tianjun Yu, Shuangqing Wang, Xudong Guo, Rui Hu, Peng Tian, Michaela Vockenhuber, Dimitrios Kazazis, Yasin Ekinci*, Guoqiang Yang*, Yi Li*, ‘Increasing the Sensitivity of Nonchemically-Amplified Resists by Oxime Sulfonate Functionalized Polystyrene’ ACS Appl. Polym. Mater., 2024, 6(9), 5374–5384.
6. Yake Wang, Jinping Chen*, Yi Zeng, Tianjun Yu, Shuangqing Wang, Xudong Guo, Rui Hu, Peng Tian, Michaela Vockenhuber, Dimitrios Kazazis, Yasin Ekinci,* Yanqing Wu, Shumin Yang, Jun Zhao, Guoqiang Yang,* and Yi Li*, Nonchemically Amplified Molecular Resists Based on Sulfonium-Functionalized Sulfone Derivatives for Sub-13 nm Nanolithography’ ACS Appl. Nano Mater., 2023, 6 (19), 18480-18490.
7. Zhihao Wang, Jinping Chen*, Tianjun Yu, Yi Zeng, Xudong Guo, Shuangqing Wang, Timothée Allenet, Michaela Vockenhuber, Yasin Ekinci*, Guoqiang Yang*, Yi Li*, ‘Sulfonium-Functionalized Polystyrene Based Non-chemically Amplified Resists Enabling sub-13 nm Nanolithography’ ACS Appl. Mater. Interfaces, 2023, 15 (1), 2289-2300.
8. Shengwen Hu, Jinping Chen*, Tianjun Yu, Yi Zeng, Xudong Guo, Shuangqing Wang, Guoqiang Yang*, Yi Li*, Photoresists Based on Bisphenol A Derivatives with tert-Butyl Ester Groups for Electron Beam Lithography J. Photochem. Photobiol. A Chem. 2023, 436, 114351.
9. Shengwen Hu, Jinping Chen*, Tianjun Yu, Yi Zeng, Shuangqing Wang, Xudong Guo, Guoqiang Yang*, Yi Li*, A Novel Dual-tone Molecular Glass Resist Based on Adamantane Derivatives for Electron Beam Lithography. J. Mater. Chem. C 2022, 10, 9858-9866.
10. Zhihao Wang, Jinping Chen*, Tianjun Yu, Yi Zeng, Guoqiang Yang*, Timothee Allenet, Vockenhuber Michaela, Ekinci Yasin, Yi Li*, Water Developable Non-chemically Amplified Photoresist for Electron Beam and Extreme Ultraviolet Lithography. J. Micro/Nanopattern. Mater. Metrol. 2022, 21(4),
1）北京市科技新星（2009）
2）中国科学院青年创新促进会会员（2011）
3）中国科学院光化学转换与功能材料重点实验室学术报告特等奖（2013）
4）理化青年论坛青年学术报告优秀奖(2014)
5) 中国科学院青年创新促进会优秀会员（2015）
6）中国科学院理化技术研究所优秀员工（2021）
人才队伍